Program Image Science and Technology of Nanolithography

Science and Technology of Nanolithography

Bachelor

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In state-of-the-art nanolithography a mask containing the layout of a computer chip is imaged, using extreme ultraviolet (EUV) light, onto a thin layer of photo-resist on top of a semiconductor wafer from which the computer chips are fabricated. In this summer course we will follow the path that the light in said state-of-the-art nanolithography takes, and also address the challenges of illuminating wafers and precisely monitoring the imprints of nanostructures on the wafers.

We will cover the surprisingly rich physics behind some of the fundamental processes occurring in Nanolithography. These range from the interaction of intense laser light with metals, the generation of plasmas, the generation of EUV light in plasmas, the creation of good mirrors out of badly reflecting materials, (sub-)nm metrology on semiconductor structures and the light sources needed for such metrology.

Language

English

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ECTS credits

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Numerus Fixus

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Contact

Vrije Universiteit Amsterdam

Main address
De Boelelaan 1105
1081 HV Amsterdam
020-5985020

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