
Science and Technology of Nanolithography
Bachelor

In state-of-the-art nanolithography a mask containing the layout of a computer chip is imaged, using extreme ultraviolet (EUV) light, onto a thin layer of photo-resist on top of a semiconductor wafer from which the computer chips are fabricated. In this summer course we will follow the path that the light in said state-of-the-art nanolithography takes, and also address the challenges of illuminating wafers and precisely monitoring the imprints of nanostructures on the wafers.
We will cover the surprisingly rich physics behind some of the fundamental processes occurring in Nanolithography. These range from the interaction of intense laser light with metals, the generation of plasmas, the generation of EUV light in plasmas, the creation of good mirrors out of badly reflecting materials, (sub-)nm metrology on semiconductor structures and the light sources needed for such metrology.
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Title
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Duration
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ECTS credits
ECTS
The European Credit Transfer and Accumulation System (ECTS) is a student-centred system based on the student workload required to achieve the objectives of a programme of study. Its aim is to facilitate the recognition of study periods undertaken by mobile students through the transfer of credits. The ECTS is based on the principle that 60 credits are equivalent to the workload of full-time student during one academic year.
Accreditation
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Numerus Fixus
No Numerus Fixus
Without numerus fixus.
Tuition fee
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Admission
Application requirements
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EU/EEAThe EU/EEA rate is the regular fee for students from within the EU/EEA. |
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Non-EU/EEAThe non-EU/EEA rate is the rate for students from outside the EU/EEA. |
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InstitutionalThe institutional rate is for all students who have already obtained a bachelor’s or master’s degree and who want to start a second programme leading to a degree at the same level or at a lower level. |
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Contact
Main addressDe Boelelaan 1105
1081 HV Amsterdam
020-5985020
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